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CITATION

Eynon, Benjamin and Wu, Banqiu. Photomask Fabrication Technology. US: McGraw-Hill Professional, 2005.

Photomask Fabrication Technology

Authors: Benjamin Eynon and Banqiu Wu

Published:  July 2005

eISBN: 9780071588911 0071588914 | ISBN: 9780071445634
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  • Contents
  • Contributors
  • Preface
  • Chapter 1. Introduction
  • Chapter 2. Data Preparation
  • Chapter 3. Pattern Generation
  • Chapter 4. Photomask Pattern Transfer
  • Chapter 5. Photomask Metrology
  • Chapter 6. Process Back End and Defectivity Control
  • Chapter 7. Resolution Enhancement Techniques
  • Chapter 8. NGL Mask Technology Introduction
  • Index