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CITATION

Kundu, Sandip and Sreedhar, Aswin. Nanoscale CMOS VLSI Circuits: Design for Manufacturability. US: McGraw-Hill Professional, 2010.

Nanoscale CMOS VLSI Circuits: Design for Manufacturability

Authors: Sandip Kundu and Aswin Sreedhar

Published:  June 2010

eISBN: 9780071635202 0071635203 | ISBN: 9780071635196
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Book description:

Cutting-Edge CMOS VLSI Design for Manufacturability Techniques

This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.

Nanoscale CMOS VLSI Circuits covers:

  • Current trends in CMOS VLSI design

  • Semiconductor manufacturing technologies

  • Photolithography

  • Process and device variability: analyses and modeling

  • Manufacturing-Aware Physical Design Closure

  • Metrology, manufacturing defects, and defect extraction

  • Defect impact modeling and yield improvement techniques

  • Physical design and reliability

  • DFM tools and methodologies

Dr. Sandip Kundu is a professor in the Electrical and Computer Engineering Department at the University of Massachusetts at Amherst, specializing in semiconductor and lithographic manufacturing.

Dr. Aswin Sreedhar is a research assistant at the Electrical and Computer Engineering Department at the University of Massachusetts.

Keywords: SANDIP KUNDU, ASWIN SREEDHAR, BOOK, HOW TO, GUIDE, DESIGN, SEMICONDUCTOR, COMPUTER, DFM, DESIGN FOR MANUFACTURABILITY, SYSTEM, CMOS VLSI DESIGN, DESIGN FOR RELIABILITY, SEMICONDUCTOR MANUFACTURING, FABRICATION, LITHOGRAPHY SIMULATION, FRAUNHOFER DIFFRACTION, AERIAL IMAGE FORMATION, AERIAL IMAGING SIMULATION, INVERSE LITHOGRAPHY SIMULATION, LITHOGRAPHIC PROCESS VARIABILITY, VARIABILITY GATE LENGTH, WIDTH, THRESHOLD VOLTAGE VARIABILITY, METAL CMP, INTERCONNECT LINEWIDTH VARIATION, INTERCONNECT LER, LITHOGRAPHIC CONTROL, PHYSICAL DESIGN RULES CHECK, MODEL-BASED DESIGN RULE CHECKS, RESOLUTION ENHANCEMENT TECHNIQUES, RET, PROXIMITY CORRECTION, SRAF, PHASE SHIFT MASKING, OFF-AXIS ILLUMINATION, PRINTED CIRCUITS HANDBOOK, THE ENCYCLOPEDIA OF ELECTRONIC CIRCUITS, SECRETS OF RF CIRCUIT DESIGN, COMPLETE WIRELESS DESIGN, PRINTED CIRCUIT ASSEMBLY DESIGN, SILICON-ON-SAPPHIRE CIRCUITS AND SYSTEMS, SPICE CIRCUIT HANDBOOK, FAILURE-FREE INTEGRATED CIRCUIT PACKAGES, CHARGE PUMP CIRCUIT DESIGN, ASIC DESIGN IN THE SILICON SANDBOX