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CITATION

Kundu, Sandip and Sreedhar, Aswin. Nanoscale CMOS VLSI Circuits: Design for Manufacturability. US: McGraw-Hill Professional, 2010.

Nanoscale CMOS VLSI Circuits: Design for Manufacturability

Authors: Sandip Kundu and Aswin Sreedhar

Published:  June 2010

eISBN: 9780071635202 0071635203 | ISBN: 9780071635196
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  • Contents
  • Preface
  • 1 Introduction
  • Technology Trends: Extending Moore’s Law
  • Device Improvements
  • Contributions from Material Science
  • Deep Subwavelength Lithography
  • Design for Manufacturability
  • Value and Economics of DFM
  • Variabilities
  • The Need for a Model-Based DFM Approach
  • Design for Reliability
  • Summary
  • References
  • 2 Semiconductor Manufacturing
  • Introduction
  • Patterning Process
  • Photolithography
  • Etching Techniques
  • Optical Pattern Formation
  • Illumination
  • Diffraction
  • Imaging Lens
  • Exposure System
  • Aerial Image and Reduction Imaging
  • Resist Pattern Formation
  • Partial Coherence
  • Lithography Modeling
  • Phenomenological Modeling
  • Fully Physical Resist Modeling
  • Summary
  • References
  • 3 Process and Device Variability: Analysis and Modeling
  • Introduction
  • Gate Length Variation
  • Patterning Variations Due to Photolithography
  • Line Edge Roughness: Theory and Characterization
  • Gate Width Variation
  • Atomistic Fluctuations
  • Thickness Variation in Metal and Dielectric
  • Stress-Induced Variation
  • Summary
  • References
  • 4 Manufacturing-Aware Physical Design Closure
  • Introduction
  • Control of the Lithographic Process Window
  • Resolution Enhancement Techniques
  • Optical Proximity Correction
  • Subresolution Assist Features
  • Phase Shift Masking
  • Off-Axis Illumination
  • Physical Design for DFM
  • Geometric Design Rules
  • Restrictive Design Rules
  • Model-Based Rules Check and Printability Verification
  • Manufacturability-Aware Standard Cell Design
  • Mitigating the Antenna Effect
  • Placement and Routing for DFM
  • Advanced Lithographic Techniques
  • Double Patterning
  • Inverse Lithography
  • Other Advanced Techniques
  • Summary
  • References
  • 5 Metrology, Manufacturing Defects, and Defect Extraction
  • Introduction
  • Process-Induced Defects
  • Classification of Error Sources
  • Defect Interaction and Electrical Effects
  • Modeling Particle Defects
  • Layout Methods to Improve Critical Area
  • Pattern-Dependent Defects
  • Pattern-Dependent Defect Types
  • Pattern Density Problems
  • Statistical Approach to Modeling Patterning Defects
  • Layout Methods That Mitigate Patterning Defects
  • Metrology
  • Precision and Tolerance in Measurement
  • CD Metrology
  • Overlay Metrology
  • Other In-Line Measurements
  • In-Situ Metrology
  • Failure Analysis Techniques
  • Nondestructive Techniques
  • Destructive Techniques
  • Summary
  • References
  • 6 Defect Impact Modeling and Yield Improvement Techniques
  • Introduction
  • Modeling the Impact of Defects on Circuit Behavior
  • Defect-Fault Relationship
  • Role of Defect-Fault Models
  • Test Flow
  • Yield Improvement
  • Fault Tolerance
  • Fault Avoidance
  • Summary
  • References
  • 7 Physical Design and Reliability
  • Introduction
  • Electromigration
  • Hot Carrier Effects
  • Hot Carrier Injection Mechanisms
  • Device Damage Characteristics
  • Time-Dependent Dielectric Breakdown
  • Mitigating HCI-Induced Degradation
  • Negative Bias Temperature Instability
  • Reaction-Diffusion Model
  • Static and Dynamic NBTI
  • Design Techniques
  • Electrostatic Discharge
  • Soft Errors
  • Types of Soft Errors
  • Soft Error Rate
  • SER Mitigation and Correction for Reliability
  • Reliability Screening and Testing
  • Summary
  • References
  • 8 Design for Manufacturability: Tools and Methodologies
  • Introduction
  • DFx in IC Design Flow
  • Standard Cell Design
  • Library Characterization
  • Placement, Routing, and Dummy Fills
  • Verification, Mask Synthesis, and Inspection
  • Process and Device Simulation
  • Electrical DFM
  • Statistical Design and Return on Investment
  • DFM for Optimization Tools
  • DFM-Aware Reliability Analysis
  • DFx for Future Technology Nodes
  • Concluding Remarks
  • References
  • Index